GBS Elektronik GmbH

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Universal Pulse Generators

RUP3

The high-voltage pulse generators of the RUP3 series consist of a high-voltage power supply with a connected semiconductor module. This topology allows completely freely selectable pulse widths and duty cycles up to 100% (DC operation). Protection against overcurrent and short circuits in the load is provided by protective resistors. For this reason, the RUP3 pulse generators are also more suitable for high-resistance loads with smaller to medium capacities. The pulse generators of the RUP3 series are very fast; Especially with devices with an output resistance of 50-100 Ohm, rise times of 50 ns are typical.

RUP3
RUP3-3A
RUP3
RUP3-10bip
RUP3
RUP3-2a

The outstanding features of the RUP3 series are:

  • Real square pulse with active shutdown (for models with "A" in the designation)
  • Very fast rise times
  • Pulse length almost completely freely adjustable
  • Duty cycle up to 100%
  • Individual scalability of the voltage
  • Over current and short circuit protection

General Specifications:

  • Models versions with high voltages from -3kV to + 25kV
  • Models with current pulse from 1A to 30A
  • 30mA average rms current
  • Typical rise time 50 - 100ns
  • Frequencies up to 10kHz

Special variants:

  • Bipolar design
  • Integrated, adjustable bias voltage 0 to -200V
  • Special version with alternating voltage bias up to ± 200V
  • Versions with 2 outputs that can be actuated phase-shifted
  • Special high-power version up to 5kW
  • OEM versions

Applications

  • Power supply for ion sources
  • Plasma immersion applications
  • Insulation tests on capacitive loads

Downloads RUP3 Series

PDF Data sheet RUP3-3A

PDF RUP3 bipolar (RUP3-7bip) English

PDF RUP3 Dual (RUP3-6ax2) German

PDF RRUP3 ion source (RUP3-5ion) German

Further variants can be found in our download section >>

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References of GBS Elektronik GmbH

Research Center Dresden-Rossendorf | Technical University of Berlin | University of Frankfurt | Society of Heavy Ion Research, Darmstadt | University of Augsburg | Institute for Surface Modification, Leipzig | Research Center Jülich | European Commission, Luxembourg | Institute for Reference Materials and Measurements, Geel, Belgium | Joint Research Center Ispra, Italy | Instituto Nacional de Pesquisas Espaciais, Brazil | CNEA, Argentina | National Accelerator Center, Cape Town, South Africa | Samsung, South Korea | University of Sydney, Australia